James Van Gogh
15Patents
10h-index
32Co-inventors
72Inventor score
Filing activity: Dec 16, 1994 → Aug 8, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6228236A | Sputter magnetron having two rotation diameters | Electricity | 59 | Expired |
| US5658442A | Target and dark space shield for a physical vapor deposition system | Electricity | 56 | Expired |
| US5922133A | Multiple edge deposition exclusion rings | Electricity | 47 | Expired |
| US6059945A | Sputter target for eliminating redeposition on the target sidewall | Electricity | 33 | Expired |
| US5650052A | Variable cell size collimator | Electricity | 26 | Expired |
| US6228235A | Magnetron for low pressure, full face erosion | Electricity | 25 | Expired |
| US6579426B1 | Use of variable impedance to control coil sputter distribution | Electricity | 23 | Expired |
| US5914018A | Sputter target for eliminating redeposition on the target sidewall | Electricity | 15 | Expired |
| US6627056B2 | Method and apparatus for ionized plasma deposition | Electricity | 13 | Expired |
| US6023038A | Resistive heating of powered coil to reduce transient heating/start up effects multiple loadlock system | Electricity | 13 | Expired |
| US7407565B2 | Method and apparatus for ionized plasma deposition | Electricity | 10 | Expired |
| US7097744B2 | Method and apparatus for controlling darkspace gap in a chamber | Electricity | 9 | Expired |
| US6193811A | Method for improved chamber bake-out and cool-down | Emerging Cross-Sectional Technologies | 6 | Expired |
| US5516403A | Reversing orientation of sputtering screen to avoid contamination | Electricity | 4 | Expired |
| US10559483B2 | Platform architecture to improve system productivity | Electricity | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.