Method and apparatus for measuring substrate temperatures
US5660472A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 19, 1994 |
| Grant date | Aug 26, 1997 |
| Priority date | — |
| Expiry date | Dec 19, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/918
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of correcting a temperature probe reading in a thermal processing chamber for heating a substrate, including the steps of heating the substrate to a process temperature; using a first probe and a second probe to measure the temperature of the substrate, the first probe having a first effective reflectivity and the second chamber having a second effective reflectivity, the first probe producing a first temperature indication and the second probe producing a second temperature indication, and wherein the first and second effective reflectivities are different; and from the first and second temperature indications, deriving a corrected temperature reading for the first probe, wherein the corrected temperature reading is a more accurate indicator of an actual temperature of the substrate than are uncorrected readings produced by both the first and second probes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.