Gas laser apparatus
US5663977A · kind A · utility
3Cited by
6References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 19, 1996 |
| Grant date | Sep 2, 1997 |
| Priority date | — |
| Expiry date | Mar 19, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/036
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A gas laser apparatus is operated in such a manner that gas supplied to a laser chamber is excited for laser oscillation. A cabinet (11) which houses gas containers (12 and 13) is located adjacent to the laser oscillator (1) or integrated with it, The piping for the laser gas is incorporated in the cabinet, Such a structure realizes an economical laser of stabilized performance and easy maintenance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.