Semiconductor device having a polycrystalline silicon film with crystal grains having a uniform orientation
US5670793A · kind A · utility
11Cited by
4References
19Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 14, 1995 |
| Grant date | Sep 23, 1997 |
| Priority date | — |
| Expiry date | Sep 14, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A semiconductor device containing a polycrystalline silicon thin film wherein crystal grains of the silicon thin film have mainly a columnar structure and a crystal orientation of individual crystal grains is almost in a uniform direction can be produced by depositing a non-impurity-doped silicon thin film or an impurity layer on an interface of underlying film, followed by deposition of impurity-doped silicon thin film, if necessary, followed by heat treatment for polycrystallization.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.