Patent · US Expired

Wafer scrubbing device

US5675856A · kind A · utility

55Cited by
20References
20Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJun 14, 1996
Grant dateOct 14, 1997
Priority date
Expiry dateJun 14, 2016

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG11B23/505
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

A wafer scrubbing device for cleaning the surfaces of a thin disk disposed on a stationary spin chuck employs a double brush arrangement whereby brush rotation induces rotation of the disk to be cleaned and whereby the speed differential between the constant rotational speed of the brushes and the variable rotational speed of the disk due to the relative position of the brushes on the disk causes the scrubbing of both surfaces and the edge of the disk.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.