Resist treating method
US5686143A · kind A · utility
15Cited by
0References
6Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Feb 2, 1996 |
| Grant date | Nov 11, 1997 |
| Priority date | — |
| Expiry date | Feb 2, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/141
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
There is provided a double-sided substrate cleaning apparatus including a carrier station for loading/unloading a carrier in which objects to be processed are stored, a convey mechanism for conveying an object taken out from the carrier station, at least one cleaning mechanism, arranged along a convey path on which the convey mechanism conveys the object, for cleaning the object, and an object reversing mechanism, arranged along the convey path, for reversing the object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.