Apparatus for developing a resist-coated substrate
US5689749A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Aug 31, 1995 |
| Grant date | Nov 18, 1997 |
| Priority date | — |
| Expiry date | Aug 31, 2015 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05C11/08
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A developing apparatus for developing a photoresist-coated substrate comprises a spin chuck having a supporting surface smaller in size than the substrate and adapted to be spin-driven with the photoresist-coated substrate surface held upward, a cup surrounding the spin chuck, a developing solution nozzle for applying a developing solution on the photoresist-coated substrate held on the spin chuck, a first washing solution nozzle for applying a washing solution to the photoresist-coated surface of the substrate held on the spin chuck, a second washing solution nozzle for applying the washing solution to a rear surface of the substrate on the spin chuck, a liquid seal ring mounted substantially coaxial with the spin chuck and having a diameter greater than the supporting surface of the spin chuck and smaller than the substrate, and a liquid film forming section provided on an upper end of the liquid seal ring and located near and opposite a peripheral edge portion of a rear surface of the substrate on the spin chuck to provide a clearance relative to the peripheral edge portion of the rear surface of the substrate, in which the liquid film forming section includes a first wall porti…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.