Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom
US5693749A · kind A · utility
8Cited by
11References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 20, 1995 |
| Grant date | Dec 2, 1997 |
| Priority date | — |
| Expiry date | Sep 20, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G8/08
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A process for producing a water insoluble, aqueous alkali soluble, film forming novolak resin fraction having a low metal ion content, made by the fractionation of a phenol formaldehyde condensation product, a process for producing a photoresist compositions containing such a novolak resin, and a method for producing a semiconductor device using such a photoresist composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.