Method of accurate compositional analysis of dielectric films on semiconductors
US5707484A · kind A · utility
0Cited by
6References
5Claims
0Family size
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Key dates
| Filing date | Oct 4, 1995 |
| Grant date | Jan 13, 1998 |
| Priority date | — |
| Expiry date | Oct 4, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of accurately determining the composition of a dielectric film in a semiconductor device by performing a compositional analysis on a film only portion of the semiconductor device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.