Diluted nitrogen trifluoride thermal cleaning process
US5714011A · kind A · utility
3Cited by
6References
11Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Feb 17, 1995 |
| Grant date | Feb 3, 1998 |
| Priority date | — |
| Expiry date | Feb 17, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for the dynamic cleaning of semiconductor fabrication equipment and particularly quartzware with thermally activated diluted nitrogen trifluoride at elevated temperatures, typically at the process operation temperature, wherein the cleaning effluent is safely removed and cleaning by-products isolated or diluted to provide for efficient cleaning and rapid restarts of fabrication equipment so cleaned.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.