Rapid thermal processing high-performance multizone illuminator for wafer backside heating
US5715361A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Apr 13, 1995 |
| Grant date | Feb 3, 1998 |
| Priority date | — |
| Expiry date | Apr 13, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A multizone illuminator rapid thermal processing system for fabricating a semiconductor device having a face on which an electronic medium is deposited. The system includes a processing chamber for establishing a semiconductor device fabrication environment for rapid thermal processing, an optically reflective gas injector for injecting a process gas into the semiconductor device fabrication environment, a semiconductor device holding mechanism for holding the semiconductor device in the semiconductor device fabrication environment, and a multizone illuminator positioned in association with the process chamber for illuminating the backside of the semiconductor device to perform a rapid semiconductor thermal process. The system can also include a multipoint temperature sensor system used in conjunction with a multizone variable temperature controller to increase dynamic temperature uniformity and repeatability control.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.