Positive photoresist composition containing a 2,4-dinitro-1-naphthol
US5719004A · kind A · utility
3Cited by
7References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 7, 1996 |
| Grant date | Feb 17, 1998 |
| Priority date | — |
| Expiry date | Aug 7, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0226
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A light-sensitive positive photoresist composition containing a film forming novolak resin, a quinone-diazide photoactive compound, a solvent, and a 2,4-dinitro-1-naphthol dye, where the dye is present at a level greater than 0.5 weight percent of the total photoresist composition. The dye reduces the linewidth variation of the resist pattern on a reflective substrate without significantly reducing the lithographic performance of the light-sensitive composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.