Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
US5729331A · kind A · utility
91Cited by
21References
74Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 30, 1995 |
| Grant date | Mar 17, 1998 |
| Priority date | — |
| Expiry date | May 30, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70791
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There is disclosed an exposure apparatus for, while moving a first object and a second object in a certain moving direction, effecting projection exposure of an image of the first object onto the second object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.