Dry-developable positive resist

US5733706A · kind A · utility

Assignee

• Siemens Aktiengesellschaft · DE

Inventors

• Recai Sezi · Simmerath, DE
• Rainer Leuschner · Regensburg, DE
• Horst Borndorfer · Erlangen, DE
• Eva Rissel · Forchheim, DE
• Michael Sebald · Waischenfeld, DE
• Hellmut Ahne · Königsee, DE
• Siegfried Birkle · Höchstadt an der Aisch, DE
• Eberhard Kuhn · Hemhofen, DE

Key dates

• Filing date: Nov 25, 1996
• Grant date: Mar 31, 1998
• Expiry date: Nov 25, 2016

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/115
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A dry-developable, positively acting TSI resist contains the following components: PA1 a suitable solvent, PA1 a strong acid former as the photoactive component, and PA1 a base polymer in the form of a copolymer or terpolymer with maleic acid anhydride as a basic unit and glycidyl methacrylate and/or a styrene derivative as a further basic unit, and possibly an additive.