Projection exposure apparatus correcting tilt of telecentricity
US5739899A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 17, 1996 |
| Grant date | Apr 14, 1998 |
| Priority date | — |
| Expiry date | May 17, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7034
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
A projection exposure apparatus wherein a pattern formed on a mask is projected onto a substrate through a projection optical system. The apparatus has an illumination optical system for illuminating the mask by exposure light, and a first adjusting member which is disposed in the illumination optical system to change telecentricity on the substrate. The apparatus further has a second adjusting member for adjusting at least one of the position of the substrate in the direction of an optical axis of the projection optical system and the tilt of the substrate, and a control system for controlling the first and second adjusting members. The control system locally corrects the position of a spatial image formed by the projection optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.