Monopolar electrostatic chuck having an electrode in contact with a workpiece
US5745332A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 8, 1996 |
| Grant date | Apr 28, 1998 |
| Priority date | — |
| Expiry date | May 8, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T279/23
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A monopolar electrostatic chuck having a conductive pedestal base with a dielectric layer deposited thereupon. Upon the top surface of the dielectric layer is deposited a wafer spacing mask fabricated from a conduction material. The wafer spacing mask contains a plurality of support members that support a workpiece in a spaced apart relation with respect to said dielectric layer. At least one of said support members in said plurality of support members is adapted for connection to a power supply. The chucking voltage power supply is connected between the conductive pedestal base and the wafer support mask. In this manner, the workpiece is attracted to and thereby retained on the chuck without a plasma being generated proximate the wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.