Charged particle beam transfer device exhibiting low aberration
US5747819A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 30, 1996 |
| Grant date | May 5, 1998 |
| Priority date | — |
| Expiry date | Oct 30, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31788
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A charged particle beam transfer device exhibiting a low level of aberration is disclosed. The device comprises a first deflector for deflecting a charged particle beam, that has passed through a subfield on a reticle, such that the beam passes through the optical axis, or at least the center, of a projection lens. To such end, the first deflector deflects the beam a first angle of deflection relative to an optical axis of the device. The device also comprises a second deflector to deflect the beam, after having passed through the projection lens, at a second angle of deflection that is opposite the first angle of deflection. Thus, the beam is guided to a region on a substrate surface corresponding to the particular subfield on the reticle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.