Process for fabricating a device
US5750312A · kind A · utility
57Cited by
4References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 2, 1994 |
| Grant date | May 12, 1998 |
| Priority date | — |
| Expiry date | May 2, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/162
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
It has been found that surface reactions with basic materials such as amines found in the processing environment during lithographic processing contribute to a loss of linewidth control for resists such as chemically amplified resists. This loss in linewidth results from the reaction of the acid generated by exposing radiation with, for example, the amine resulting in a lack of chemical reaction where such reaction is desired. The problem is solved in one embodiment by employing an acid containing barrier layer on the resist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.