Mask holding device and method for holding mask
US5751538A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Sep 26, 1996 |
| Grant date | May 12, 1998 |
| Priority date | — |
| Expiry date | Sep 26, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH02N13/00
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A mask holding device of a charged particle beam projecting apparatus for projecting a pattern of a mask on a radiation sensitive substrate by means of a charged particle beam includes an electrostatic chuck for holding the mask, and a conductive member for grounding the mask. The electrostatic chuck has an aperture through which the charged particle beam passes after being transmitted through the mask, and includes an electrode or electrodes for producing an electrostatic force between the mask and the electrostatic chuck so as to attract and hold the mask onto the electrostatic chuck. The conductive member covers at least a portion of the electrostatic chuck which defines the aperture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.