Method for forming a substantially uniform array of sharp tips
US5753130A · kind A · utility
6Cited by
28References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 18, 1996 |
| Grant date | May 19, 1998 |
| Priority date | — |
| Expiry date | Jun 18, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2201/30403
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for fabricating sharp asperities. A substrate is provided which has a mask layer disposed thereon, and a layer of micro-spheres is disposed superjacent the mask layer. The micro-spheres are for patterning the mask layer. Portions of the mask layer are selectively removed, thereby forming circular masks. The substrate is isotropically etched, thereby creating sharp asperities.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.