Exposure apparatus with light shielding portion for plotosensitive elements
US5760881A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 10, 1995 |
| Grant date | Jun 2, 1998 |
| Priority date | — |
| Expiry date | Oct 10, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus, having an illumination optical system for radiating a light beam from a light source to a pattern area of a mask for transferring the image of the pattern area onto a photosensitive substrate by the light beam passing through the mask, is provided with plural sets of a first reference mark and a second reference mark arranged on the mask and the photosensitive substrate at positions corresponding to each other, and a light-shielding device for shielding the light beams radiated toward the second reference marks, whereby it is possible to re-use the second reference marks in a post-process by preventing the first reference marks on the mask from being superposed on the second reference marks on the photosensitive substrate or from being transferred onto a part near the second reference marks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.