Plasma guard for chamber equipped with electrostatic chuck
US5762714A · kind A · utility
50Cited by
1References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 18, 1994 |
| Grant date | Jun 9, 1998 |
| Priority date | — |
| Expiry date | Oct 18, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32559
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma guard member that has the configuration of a flat concentric ring is used in a vacuum process chamber equipped with a plasma reaction chamber, a plasma source and a lower chamber which houses an electrostatic chuck for preventing charged particles from drifting or diffusing to the lower chamber and contact the electrostatic chuck such that the substrate holding capability of the chuck is not adversely affected.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.