Semiconductor processor with wafer face protection
US5762751A · kind A · utility
79Cited by
1References
41Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 17, 1995 |
| Grant date | Jun 9, 1998 |
| Priority date | — |
| Expiry date | Aug 17, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67086
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A semiconductor processing station which utilizes a processing head and processing base which are complementary to enclose a processing chamber. The processing head shown has a rotor with two portions both of which rotate. The rotor has axial movable portions which include a piece holder. The piece holder supports a wafer or other semiconductor piece being processed. The piece holder can be axially extended and retracted relative to a thin membrane which acts as a cover to prevent chemicals from reaching the back side of the wafer during processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.