Photoresist having increased sensitivity and use thereof
US5770345A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 16, 1996 |
| Grant date | Jun 23, 1998 |
| Priority date | — |
| Expiry date | Jul 16, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/125
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The sensitivity of a photoresist to actinic light is improved by the addition of certain dyes. The photoresist includes a polymer matrix, a photosensitive acid generator and at least one compound selected from the group consisting of dyes containing at least one heterosulphur atom such as 2,2.sup.1,5.sup.1,2"-terthiophene and its derivatives; thianthrene and its derivatives, and 4,6-diphenylthieno(3,4-d)-1,3-dioxol-2-one-5,5-dioxide; phenylsulfone and its derivatives; and 4,5-diphenyl-1,3-dioxol-2-one; 3,4-bis(acetoxymethyl)furan; chelidonic acid and its derivatives; and 5,7,12,14-pentacenetetrone. Resist images on a substrate are formed from the compositions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.