Charged particle beam projection apparatus
US5770863A · kind A · utility
37Cited by
5References
21Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 24, 1996 |
| Grant date | Jun 23, 1998 |
| Priority date | — |
| Expiry date | Oct 24, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31764
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
In a charged particle beam projection apparatus in which a plurality of areas are defined in a mask and a pattern in each area is projected in a corresponding area on a substrate such as a semiconductor wafer or the like, in order to reduce aberration caused by magnetic lens or deflectors when projecting the mask pattern onto the substrate, the positioning and dimensions of these magnetic lenses or the deflectors are set so that specific relationships are achieved, or a distortion in the mask pattern projected on the substrate is corrected in correspondence to the partitioned areas on the mask pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.