Exposure method and apparatus with control of a linear motor
US5777721A · kind A · utility
5Cited by
10References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 28, 1995 |
| Grant date | Jul 7, 1998 |
| Priority date | — |
| Expiry date | Aug 28, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T74/20354
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A coordinate position of a stage for supporting a wafer or a reticle which is driven by a linear motor includes a stator and a mover is measured by a laser interferometer, and a thrust obtained from a deviation between the measured coordinate position and an aimed coordinate position is output to a multiplier. Further, a cosine function corresponding to a phase between the stator and the mover is obtained on the basis of the measured coordinate position and is output to the multiplier. Then, an exciting current is supplied to an armature coil of the linear motor on the basis of an output of the multiplier.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.