Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween
US5781693A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 24, 1996 |
| Grant date | Jul 14, 1998 |
| Priority date | — |
| Expiry date | Jul 24, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B31/16
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A showerhead for use with a lamp head in a thermal processing chamber, the lamp head including a high intensity source which emits radiation that heats a substrate within the chamber, the showerhead including a top window on a side of the showerhead that is adjacent to the lamp head; a bottom window on a side of the showerhead that is adjacent to the substrate during processing; and a gas supply inlet through which a gas is introduced into a space between the top and bottom windows, wherein the top and bottom windows are transparent to the radiation from the source in the lamp head and wherein the bottom window includes a plurality of gas distribution holes through which gas is injected from the space between the top and bottom windows into the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.