Benjamin Bierman
14Patents
13h-index
14Co-inventors
64Inventor score
Filing activity: Jul 24, 1996 → Jul 6, 2000
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5781693A | Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween | Chemistry; Metallurgy | 809 | Expired |
| US5879128A | Lift pin and support pin apparatus for a processing chamber | Emerging Cross-Sectional Technologies | 518 | Expired |
| US6090210A | Multi-zone gas flow control in a process chamber | Electricity | 122 | Expired |
| US5960555A | Method and apparatus for purging the back side of a substrate during chemical vapor processing | Chemistry; Metallurgy | 61 | Expired |
| US6157106A | Magnetically-levitated rotor system for an RTP chamber | Electricity | 49 | Expired |
| US6215106A | Thermally processing a substrate | Chemistry; Metallurgy | 44 | Expired |
| US5848889A | Semiconductor wafer support with graded thermal mass | Electricity | 41 | Expired |
| US6395363B1 | Sloped substrate support | Emerging Cross-Sectional Technologies | 39 | Expired |
| US5884412A | Method and apparatus for purging the back side of a substrate during chemical vapor processing | Chemistry; Metallurgy | 29 | Expired |
| US6133152A | Co-rotating edge ring extension for use in a semiconductor processing chamber | Electricity | 24 | Expired |
| US6123766A | Method and apparatus for achieving temperature uniformity of a substrate | Emerging Cross-Sectional Technologies | 23 | Expired |
| US6035100A | Reflector cover for a semiconductor processing chamber | Physics | 14 | Expired |
| US5920797A | Method for gaseous substrate support | Emerging Cross-Sectional Technologies | 13 | Expired |
| US6803546B1 | Thermally processing a substrate | Electricity | 12 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.