Position resolution of an interferometrially controlled moving stage by regression analysis
US5784166A · kind A · utility
21Cited by
2References
63Claims
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Key dates
| Filing date | Apr 3, 1996 |
| Grant date | Jul 21, 1998 |
| Priority date | — |
| Expiry date | Apr 3, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus for achieving high position resolution of a moving stage in a lithographic system utilized for the manufacture of semiconductor integrated circuits. A series of values of the stage position are measured using an interferometric system, and a present position of the stage is estimated using regression analysis applied to a selected number of the series of measured values. The resulting predicted position is of higher resolution than a single stage position measurement of the interferometric system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.