Michael Sogard
81Patents
16h-index
25Co-inventors
84Inventor score
Filing activity: Mar 9, 1994 → Mar 12, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6628503B2 | Gas cooled electrostatic pin chuck for vacuum applications | Electricity | 116 | Expired |
| US6014200A | High throughput electron beam lithography system | Electricity | 88 | Expired |
| US7456930B2 | Environmental system including vacuum scavenge for an immersion lithography apparatus | Physics | 50 | Active |
| US7321415B2 | Environmental system including vacuum scavenge for an immersion lithography apparatus | Physics | 43 | Expired |
| US5631731A | Method and apparatus for aerial image analyzer | Physics | 41 | Expired |
| US7355676B2 | Environmental system including vacuum scavenge for an immersion lithography apparatus | Physics | 37 | Expired |
| US5552888A | Apparatus for measuring position of an X-Y stage | Physics | 36 | Expired |
| US6376329B1 | Semiconductor wafer alignment using backside illumination | Physics | 34 | Expired |
| US6215642A | Vacuum compatible, deformable electrostatic chuck with high thermal conductivity | Electricity | 24 | Expired |
| US6897940B2 | System for correcting aberrations and distortions in EUV lithography | Emerging Cross-Sectional Technologies | 23 | Expired |
| US5866935A | Tunneling device | Physics | 23 | Expired |
| US6126169A | Air bearing operable in a vacuum region | Electricity | 21 | Expired |
| US5784166A | Position resolution of an interferometrially controlled moving stage by regression analysis | Physics | 21 | Expired |
| US6127749A | Two-dimensional electric motor | Electricity | 18 | Expired |
| US5954982A | Method and apparatus for efficiently heating semiconductor wafers or reticles | Electricity | 17 | Expired |
| US6770987B1 | Brushless electric motors with reduced stray AC magnetic fields | Electricity | 17 | Expired |
| US7875864B2 | Devices and methods for thermophoretic and electrophoretic reduction of particulate contamination of lithographic reticles and other objects | Physics | 15 | Active |
| US7030959B2 | Extreme ultraviolet reticle protection using gas flow thermophoresis | Physics | 14 | Expired |
| US7477358B2 | EUV reticle handling system and method | Physics | 13 | Expired |
| US5602619A | Scanner for step and scan lithography system | Physics | 13 | Expired |
| US7367138B2 | Devices and methods for thermophoretic and electrophoretic reduction of particulate contamination of lithographic reticles | Physics | 12 | Expired |
| US8089610B2 | Environmental system including vacuum scavenge for an immersion lithography apparatus | Physics | 12 | Active |
| US6989922B2 | Deformable mirror actuation system | Physics | 12 | Expired |
| US7250618B2 | Radiantly heated cathode for an electron gun and heating assembly | Electricity | 11 | Expired |
| US6734117B2 | Periodic clamping method and apparatus to reduce thermal stress in a wafer | Physics | 11 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.