Substrate spin cleaning apparatus
US5785068A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 17, 1996 |
| Grant date | Jul 28, 1998 |
| Priority date | — |
| Expiry date | May 17, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A substrate spin cleaning apparatus includes a nozzle attached through a first and second support brackets to support shaft that is rotatable about a vertical axis. The nozzle delivers a cleaning liquid to the surface of a spinning substrate in a pin-point mode and under high pressure, while moving a liquid application point on the substrate surface between the substrate spin center and peripheral edge of the substrate. The first support bracket defines an arcuate slot extending within a plane including the spin center and a tip of the nozzle and along an imaginary circle about the spin center. The nozzle is attached to the second support bracket connected to the first support bracket which in turn is through the arcuate slot, to deliver the cleaning liquid to the spin center. The application point is movable through the spin center regardless of the inclination angle of the nozzle relative to the substrate surface. The nozzle inclination angle relative to the substrate surface is readily variable in accordance with the thickness or type of layer formed on the substrate surface, or the type of contaminant to be removed therefrom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.