Deposition chamber cleaning technique using a high power remote excitation source
US5788778A · kind A · utility
138Cited by
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21Claims
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Assignee
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Key dates
| Filing date | Sep 16, 1996 |
| Grant date | Aug 4, 1998 |
| Priority date | — |
| Expiry date | Sep 16, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S156/916
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for cleaning a deposition chamber that is used in fabricating electronic devices including the steps of delivering a precursor gas into a remote chamber that is outside of the deposition chamber, activating the precursor gas in the remote chamber via a high power source to form a reactive species, flowing the reactive species from the remote chamber into the deposition chamber, and using the reactive species that is flowed into the deposition chamber from the remote chamber to clean the inside of the deposition chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.