Methods of designing a reticle and forming a semiconductor device therewith
US5827625A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 18, 1997 |
| Grant date | Oct 27, 1998 |
| Priority date | — |
| Expiry date | Aug 18, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for designing and forming a reticle (40) as well as the manufacture of a semiconductor substrate (50) using that reticle (40). The present invention places outriggers (32, 34, 36) between features (30) in both dense and semi-dense feature patterns to assist in the patterning of device features. The width of the outriggers can be changed based on pitch and location between features in a semi-dense or dense feature pattern. In one embodiment, the outriggers can be manually or automatically inserted into the layout file after the locations of the attenuating features have been determined. The outriggers are not patterned on the substrate, but assist in forming resist features of uniform width.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.