Michael E. Kling
7Patents
6h-index
11Co-inventors
52Inventor score
Filing activity: Jan 29, 1997 → Apr 25, 2001
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5900340A | One dimensional lithographic proximity correction using DRC shape functions | Physics | 222 | Expired |
| US5849440A | Process for producing and inspecting a lithographic reticle and fabricating semiconductor devices using same | Physics | 67 | Expired |
| US5920487A | Two dimensional lithographic proximity correction using DRC shape functions | Physics | 45 | Expired |
| US5958635A | Lithographic proximity correction through subset feature modification | Emerging Cross-Sectional Technologies | 38 | Expired |
| US6566019B2 | Using double exposure effects during phase shifting to control line end shortening | Physics | 30 | Expired |
| US5827625A | Methods of designing a reticle and forming a semiconductor device therewith | Physics | 29 | Expired |
| US6573010B2 | Method and apparatus for reducing incidental exposure by using a phase shifter with a variable regulator | Physics | 4 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.