Sample inspection apparatus and sample inspection method
US5828457A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | May 12, 1997 |
| Grant date | Oct 27, 1998 |
| Priority date | — |
| Expiry date | May 12, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/95607
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A sample detection apparatus includes a light radiation unit, having an illumination lens and an objective lens, for radiating light on a sample on which a pattern relating to fabrication of a semiconductor device is formed. A light receiving unit detects a light transmission image of the pattern on the sample on which the light has been radiated by the light radiation unit. A determination unit determines a presence/absence of a defect of the pattern obtained by the light receiving unit with reference data relating to the pattern, and a control unit controls a ratio .sigma. of a numerical aperture of the objective lens, in accordance with a type of the pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.