Magnetic deflectors and charged-particle-beam lithography systems incorporating same
US5831270A · kind A · utility
64Cited by
6References
32Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 18, 1997 |
| Grant date | Nov 3, 1998 |
| Priority date | — |
| Expiry date | Feb 18, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3174
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Magnetic deflectors for charged particle beams are provided. The magnetic deflectors comprise at least one pair of coils to provide high deflection sensitivity over large regions of uniform deflection without increasing the size of the magnetic core used by the deflectors. Charged-particle-beam lithography systems using such deflectors are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.