Remote plasma source
US5844195A · kind A · utility
321Cited by
29References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 18, 1996 |
| Grant date | Dec 1, 1998 |
| Priority date | — |
| Expiry date | Nov 18, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67017
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention provides a remote plasma source mountable on a process chamber and connectable on one end to a gas inletting system and on the other end to a gas distribution system disposed in a process chamber. Preferably, a conventional microwave generator is utilized to deliver microwaves into a remote chamber to excite a gas passed therethrough into an excited state.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.