Projection exposure system and method
US5847812A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 13, 1997 |
| Grant date | Dec 8, 1998 |
| Priority date | — |
| Expiry date | Jun 13, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70475
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Projection exposure systems and methods are disclosed that achieve higher light intensities and reduce the time required for each exposure in multiple exposures of non-linear resists such as a two-photon-absorption resist. Using spatial redistribution of laser light, an illumination optical system forms an illumination region that illuminates only a portion of the pattern on a mask with spatially coherent light from a light source. The system forms the entire mask pattern on a substrate by repeating a non-linear exposure while moving the illumination region and the mask pattern relative to one another. To exploit temporal redistribution of laser light, an illumination optical system employs a pulsed-oscillation-type laser light source to form a mask pattern while varying the light intensity profile on a mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.