Inventor · Yokohama, JP

Hiroshi Ooki

19Patents
8h-index
26Co-inventors
72Inventor score

Filing activity: Sep 26, 1994 → Oct 24, 2016

Most-cited inventions

PatentTitleAreaCited byStatus
US5739898A Exposure method and apparatus Physics 106 Expired
US5764363A Apparatus for observing a surface using polarized light Physics 66 Expired
US5621532A Laser scanning microscope utilizing detection of a far-field diffraction pattern with 2-dimensional detection Physics 28 Expired
US5847812A Projection exposure system and method Physics 18 Expired
US6081051A Linear/rotary actuator and winding machine including same Electricity 16 Expired
US5851707A Microlithography projection-exposure masks, and methods and apparatus employing same Physics 15 Expired
US6291145A Image formation method with photosensitive material Physics 14 Expired
US6693704B1 Wave surface aberration measurement device, wave surface aberration measurement method, and projection lens fabricated by the device and the method Physics 9 Expired
US5902716A Exposure method and apparatus Electricity 8 Expired
US6583928B2 Microscope Physics 6 Expired
US5636201A Optical disk memory for recording reproducible information Physics 5 Expired
US6500511B1 Optical disc recycling method and recycled optical disc Emerging Cross-Sectional Technologies 4 Expired
US6400502B1 Microscope Physics 4 Expired
US8081378B2 Microscope Physics 3 Active
US5694220A Minute step measuring method Performing Operations; Transporting 3 Expired
US10578973B2 Illumination optical assembly, exposure apparatus, and device manufacturing method Physics 1 Active
US10222293B2 Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method by detecting a light amount of measuring light Physics 1 Active
US9880765B2 Copy processing management system and copy processing management method Physics 0 Active
US9513560B2 Illumination optical assembly, exposure apparatus, and device manufacturing method Physics 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.