Method of calibrating a temperature measurement system
US5848842A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 20, 1996 |
| Grant date | Dec 15, 1998 |
| Priority date | — |
| Expiry date | May 20, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/918
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of calibrating a temperature measurement system including the steps of heating a first substrate having a high emissivity value to a first process temperature; while the first substrate is at the first process temperature, calibrating a first probe and a second probe to produce temperature indications from the first substrate that are substantially the same, the first probe having associated therewith a first effective reflectivity and the second probe having associated therewith a second effective reflectivity, the first and second effective reflectivities being different; heating a second substrate having a low emissivity value to a second process temperature, the low emissivity value being lower than the high emissivity value; with the second substrate at the second process temperature, using both the first probe and the second probe to measure the temperature of the second substrate, the first probe producing a first temperature indication and the second probe producing a second temperature indication different from the first temperature indication; measuring a sensitivity of the temperature indication produced by the first probe to changes in substrate emissivity; and…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.