Process for producing and inspecting a lithographic reticle and fabricating semiconductor devices using same
US5849440A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 29, 1997 |
| Grant date | Dec 15, 1998 |
| Priority date | — |
| Expiry date | Jan 29, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70633
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for fabricating a semiconductor device includes the formation of a lithographic reticle (20) having a lithographic pattern (18) overlying a reticle substrate (10). In one embodiment, a reticle inspection database incorporates altered resolution assisting features (30,32) to inspect the lithographic pattern (18). The dimensional difference between the reticle inspection database and the lithographic reticle is substantially equal to the process bias realized during reticle fabrication. Inspection of the lithographic reticle (20) using a reticle inspection database containing altered resolution assisting features reduces the false detection of defects and provides increased sensitivity in the reticle inspection process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.