Chemically amplified positive resist composition
US5849461A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 19, 1996 |
| Grant date | Dec 15, 1998 |
| Priority date | — |
| Expiry date | Jul 19, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a chemically amplified positive resist composition comprising an organic solvent, an acid labile group-protected resin and a photoacid generator, a compound having a weight average molecular weight of 100-1,000 and at least two phenolic hydroxyl groups in a molecule wherein the hydrogen atom of the phenolic hydroxyl group is partially replaced by an acid labile group in an overall average proportion of 10-80% is blended as a dissolution controller. The resist composition is highly sensitive to actinic radiation, has improved sensitivity and resolution, and is suitable for use in a fine patterning technique and commercially acceptable.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.