Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate
US5853947A · kind A · utility
2Cited by
16References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 21, 1995 |
| Grant date | Dec 29, 1998 |
| Priority date | — |
| Expiry date | Dec 21, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0236
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive positive working photosensitive composition suitable for use as a photoresist, which comprises an admixture of at least one water insoluble, aqueous alkali soluble, film forming novolak resin; at least one o-diazonaphthoquinone photosensitizer; and a photoresist solvent mixture comprising a propylene glycol alkyl ether acetate and 3-methyl-3-methoxy butanol and process for producing such a composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.