Method for cleaning substrates
US5858112A · kind A · utility
27Cited by
10References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 17, 1997 |
| Grant date | Jan 12, 1999 |
| Priority date | — |
| Expiry date | Mar 17, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate cleaning method in which the substrate is rotated and cleaned utilizing a brush which is brought into contact with the substrate. In accordance with one presently preferred aspect, the substrate is held between a stepped portion and a stopper portion at the fringe of the substrate, thereby preventing movement of the substrate as it is rotated and the brush is brought into contact with the substrate. In accordance with another aspect, a freely rotatable brush is brought into contact with the substrate so that the brush can rotate with the rotating substrate, and damage to the substrate can be minimized.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.