Plasma processing method
US5858258A · kind A · utility
1Cited by
8References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 8, 1992 |
| Grant date | Jan 12, 1999 |
| Priority date | — |
| Expiry date | Jan 8, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/334
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of plasma-processing which includes the step of plasma-processing a matter mounted on a component in a plasma processing vessel by using plasma gases, and the step of introducing an inactive gas into the plasma processing vessel when no plasma process is conducted in the vessel and gases resulted from the previous plasma process remain therein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.