Yoshifumi Tahara
21Patents
17h-index
44Co-inventors
77Inventor score
Filing activity: Dec 21, 1988 → Aug 13, 2004
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5382311A | Stage having electrostatic chuck and plasma processing apparatus using same | Electricity | 899 | Expired |
| US4931135A | Etching method and etching apparatus | Electricity | 392 | Expired |
| US5571366A | Plasma processing apparatus | Electricity | 284 | Expired |
| US6110287A | Plasma processing method and plasma processing apparatus | Electricity | 238 | Expired |
| US5356515A | Dry etching method | Electricity | 99 | Expired |
| US5270266A | Method of adjusting the temperature of a semiconductor wafer | Emerging Cross-Sectional Technologies | 59 | Expired |
| US5494522A | Plasma process system and method | Electricity | 52 | Expired |
| US5411631A | Dry etching method | Chemistry; Metallurgy | 46 | Expired |
| US4978412A | Plasma processing device | Electricity | 46 | Expired |
| US5203958A | Processing method and apparatus | Electricity | 39 | Expired |
| US4963713A | Cooling of a plasma electrode system for an etching apparatus | Electricity | 39 | Expired |
| US5302236A | Method of etching object to be processed including oxide or nitride portion | Electricity | 32 | Expired |
| US7209851B2 | Method and structure to develop a test program for semiconductor integrated circuits | Physics | 32 | Expired |
| US5089083A | Plasma etching method | Electricity | 28 | Expired |
| US6423242B1 | Etching method | Chemistry; Metallurgy | 27 | Expired |
| US5698070A | Method of etching film formed on semiconductor wafer | Electricity | 27 | Expired |
| US5449977A | Apparatus and method for generating plasma of uniform flux density | Electricity | 23 | Expired |
| US5155331A | Method for cooling a plasma electrode system for an etching apparatus | Electricity | 17 | Expired |
| US5705081A | Etching method | Electricity | 11 | Expired |
| US5164034A | Apparatus and method for processing substrate | Electricity | 10 | Expired |
| US5858258A | Plasma processing method | Electricity | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.