Ferroelectric memory device and method for producing the device

US5869860A · kind A · utility

Assignee

• Siemens Aktiengesellschaft · DE

Inventors

• Dietrich Widmann · Unterhaching, DE
• Georg Tempel · Zorneding, DE

Key dates

• Filing date: Apr 24, 1996
• Grant date: Feb 9, 1999
• Expiry date: Apr 24, 2016

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10B12/033

Abstract

A method for producing a capacitor having a dielectric and first and second capacitor electrodes in a semiconductor circuit device formed on a semiconductor substrate, includes forming a trench in a layer applied to the substrate. An electrically conductive layer for the second capacitor electrode is deposited inside the trench and at least regionally conformally with side walls thereof. An auxiliary layer acting as a space-holder for the dielectric is conformally deposited inside the trench and on the electrically conductive layer for the second capacitor electrode. An electrically conductive layer for the first capacitor electrode is conformally deposited inside the trench and on the auxiliary layer. The auxiliary layer is at least partial removed to expose a hollow layer in at least a partial region between the two electrically conductive layers for the first and second capacitor electrodes. The dielectric is deposited into the exposed hollow layer between the two electrically conductive layers. A semiconductor memory device and a method for producing the device include producing the capacitor after production of the transistor and metallizing layers associated therewith for con…