Pole trimming technique for high data rate thin film heads
US5874010A · kind A · utility
45Cited by
6References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 17, 1996 |
| Grant date | Feb 23, 1999 |
| Priority date | — |
| Expiry date | Jul 17, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/3163
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for trimming a pole used in a read-write head comprises the step of depositing a metallic layer on a layer of pole material, patterning the metallic layer so that it can serve as a mask, and ion beam etching the pole material with nitrogen ions. Of importance, a thin nitride layer forms on the metallic layer so that the etch rate of the metallic layer during ion beam etching is slowed. Alternatively, in lieu of the metallic layer, a nitride layer can be used.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.