Multiple vaporizer reagent supply system for chemical vapor deposition utilizing dissimilar precursor compositions
US5876503A · kind A · utility
59Cited by
42References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 27, 1996 |
| Grant date | Mar 2, 1999 |
| Priority date | — |
| Expiry date | Nov 27, 2016 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4485
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A system for the deposition of a multicomponent material layer on a substrate from respective liquid precursors for components of the multicomponent material layer, comprising: a vapor deposition zone; and multiple vaporizer units, each of which is joined (i) to at least one source of liquid precursor for supplying at least one liquid precursor thereto, and (ii) in vapor flow communication with the vapor deposition zone arranged to retain the substrate therein, for deposition on the substrate of vapor phase species from precursor vapor formed by vaporization of liquid precursors in the vaporizer units of the system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.