Peter C. Van Buskirk
53Patents
20h-index
46Co-inventors
88Inventor score
Filing activity: Jan 7, 1994 → Jan 19, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5362328A | Apparatus and method for delivering reagents in vapor form to a CVD reactor, incorporating a cleaning subsystem | Emerging Cross-Sectional Technologies | 347 | Expired |
| US5972430A | Digital chemical vapor deposition (CVD) method for forming a multi-component oxide layer | Chemistry; Metallurgy | 293 | Expired |
| US5711816A | Source reagent liquid delivery apparatus, and chemical vapor deposition system comprising same | Emerging Cross-Sectional Technologies | 179 | Expired |
| US6346741B1 | Compositions and structures for chemical mechanical polishing of FeRAM capacitors and method of fabricating FeRAM capacitors using same | Electricity | 164 | Expired |
| US5976928A | Chemical mechanical polishing of FeRAM capacitors | Electricity | 139 | Expired |
| US5705443A | Etching method for refractory materials | Electricity | 104 | Expired |
| US5719417A | Ferroelectric integrated circuit structure | Electricity | 81 | Expired |
| US6100200A | Sputtering process for the conformal deposition of a metallization or insulating layer | Electricity | 76 | Expired |
| US5882416A | Liquid delivery system, heater apparatus for liquid delivery system, and vaporizer | Chemistry; Metallurgy | 69 | Expired |
| US6254792A | Isotropic dry cleaning process for noble metal integrated circuit structures | Emerging Cross-Sectional Technologies | 60 | Expired |
| US5653806A | Showerhead-type discharge assembly for delivery of source reagent vapor to a substrate, and CVD process utilizing same | Chemistry; Metallurgy | 59 | Expired |
| US5876503A | Multiple vaporizer reagent supply system for chemical vapor deposition utilizing dissimilar precursor compositions | Chemistry; Metallurgy | 59 | Expired |
| US6395194B1 | Chemical mechanical polishing compositions, and process for the CMP removal of iridium thin using same | Electricity | 42 | Expired |
| US6284654A | Chemical vapor deposition process for fabrication of hybrid electrodes | Electricity | 41 | Expired |
| US6316797A | Scalable lead zirconium titanate(PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material | Electricity | 34 | Expired |
| US5998236A | Process for controlled orientation of ferroelectric layers | Electricity | 33 | Expired |
| US8322571B2 | Liner-based liquid storage and dispensing systems with empty detection capability | Performing Operations; Transporting | 29 | Active |
| US5741363A | Interiorly partitioned vapor injector for delivery of source reagent vapor mixtures for chemical vapor deposition | Chemistry; Metallurgy | 28 | Expired |
| US6184550A | Ternary nitride-carbide barrier layers | Electricity | 28 | Expired |
| US6010748A | Method of delivering source reagent vapor mixtures for chemical vapor deposition using interiorly partitioned injector | Chemistry; Metallurgy | 21 | Expired |
| US7005303B2 | Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices | Electricity | 15 | Expired |
| US9073028B2 | Liner-based liquid storage and dispensing systems with empty detection capability | Performing Operations; Transporting | 14 | Active |
| US6303391A | Low temperature chemical vapor deposition process for forming bismuth-containing ceramic films useful in ferroelectric memory devices | Electricity | 13 | Expired |
| US6846424B2 | Plasma-assisted dry etching of noble metal-based materials | Electricity | 13 | Expired |
| US6177135A | Low temperature CVD processes for preparing ferroelectric films using Bi amides | Physics | 11 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.